一． 设备简介

1、 Equipment introduction

半导体超纯水设备是应用于半导体生产零件清洗的超纯水设备，需要符合特定的用水水质标准,半导体超纯水设备出水水质要符合美国ASTM纯水水质标准、中国电子工业电子级水质技术标准(18MΩ.cm、15MΩ.cm、10MΩ.cm、2MΩ.cm、0.5MΩ.cm)、半导体工业用纯水指标、集成电路水质标准。 J9九游国际真人水务在满足用户用水标准的基础上，在设备系统中水箱均设有液位控制系统、水泵均设有压力保护装置、在线水质检测控制仪表、电气采用PLC可编程控制器，真正做到了无人职守，同时在工艺选材上采用推荐和客户要求的方法，使设备与其它同类产品相比较，具有更高的性价比和设备可靠性。

Semiconductor ultra pure water equipment is a super pure water equipment used for cleaning semiconductor production parts. It needs to meet specific water quality standards. The effluent quality of semi-conductor ultra pure water equipment shall meet the American ASTM pure water quality standard and the electronic grade water quality technical standard of China Electronic Industry (18m) Ω. cm、15M Ω. cm、10M Ω. cm、2M Ω. cm、0.5M Ω. Cm), pure water index for semiconductor industry, and water quality standard of integrated circuit. On the basis of meeting the user's water use standard, Hongjie water has set up liquid level control system in the water tank of the equipment system, pressure protection device in the water pump, online water quality detection and control instrument, and PLC programmable controller in the electrical system, so that no one is on duty. At the same time, the method of recommendation and customer requirements is adopted in the process of material selection, so that the equipment is compared with other similar products, It has higher cost performance and equipment reliability.

二． 设计标准及依据

2、 Design standard and basis

1. 根据用户提供的详细水质报告“量身定制”。

1. According to the detailed water quality report provided by the user, "customized".

2. 水处理设备技术条件《JB/T 2932-1999》

2. Technical conditions of water treatment equipment JB / T 2932-1999

3. 反渗透水处理设备标准《CJ/T119-2000》

3. Standard for reverse osmosis water treatment equipment CJ / t119-2000

4. 低压开关设备和控制设备成套装置《IEC439-1 》

4. Complete set of low voltage switchgear and control equipment iec439-1

5. 实验室超纯水技术指标标准《GB6682-2008 》

5. Technical index standard of laboratory ultra pure water gb6682-2008

6. 电子级超纯水规格《GB/T11446.1-1997》

6. Electronic grade ultra pure water specification GB / t11446.1-1997

三． 工艺流程

3、 Process flow

1、 原水－原水加压泵－多介质过滤器－活性炭过滤器－软水器－精密过滤器－级反渗透－PH调节－中间水箱－级反渗透－纯化水箱－纯水泵－EDI系统－超纯水箱－纯水泵－抛光装置－终端超滤－用水点

1. Raw water - raw water pressure pump - multi-media filter - activated carbon filter - water softener - precision filter - stage reverse osmosis - pH regulation - intermediate water tank - stage reverse osmosis - purified water tank - pure water pump EDI system - ultra pure water tank pure water pump polishing device terminal ultrafiltration water point

四． 设计特点

4、 Design features

1. 系统采用全自动控制(同时亦可采用手动控制），系统运行时可设定自动反洗、再生程序；

1. The system adopts full automatic control (manual control is also available), and automatic backwashing and regeneration procedures can be set during system operation;

2. 各单元接线均在工厂内完成，减少安装调试时间；

2. The wiring of each unit is completed in the factory to reduce the installation and debugging time;

3. 一级反渗透和二级反渗透设有回流管道，反渗透设备设有化学清洗装置；

3. The primary RO and secondary ro are equipped with return pipes, and the RO equipment is equipped with chemical cleaning device;

4. 管道一般采用UPVC材质；

4. UPVC material is generally used for pipes;

5. 集成控制系统和集成仪表系统等，方便操作管理；

5. Integrated control system and instrument system to facilitate operation and management;

6. RO膜定时清洗 具有开机和定时清洗RO

6. RO film timing cleaning has startup and regular cleaning ro